Vertical device architecture

ABSTRACT

The present disclosure relates to a vertical transistor device having rectangular vertical channel bars extending between a source region and a drain region, and an associated method of formation. In some embodiments, the vertical transistor device has a source region disposed over a semiconductor substrate. A channel region with one or more vertical channel bars is disposed over the source region. The one or more vertical channel bars have a bottom surface abutting the source region that has a rectangular shape (i.e., a shape with four sides, with adjacent sides of different length, and four right angles). A gate region is located over the source region at a position abutting the vertical channel bars, and a drain region is disposed over the gate region and the vertical channel bars. The rectangular shape of the vertical channel bars provides for a vertical device having good performance and cell area density.

BACKGROUND

Moore's law states that the number of transistors in an integratedcircuit doubles approximately every two years. To achieve Moore's law,the integrated chip industry has continually decreased the size of(i.e., scaled) integrated chip components. However, in recent years,scaling has become more difficult, as the physical limits of materialsused in integrated chip fabrication are being approached. Thus, as analternative to traditional scaling the semiconductor industry begun touse alternative technologies (e.g., FinFETs) to continue to meet Moore'slaw.

One alternative to traditional silicon planar field effect transistors(FETs), which has recently emerged, is nanowire transistor devices.Nanowire transistor devices use one or more nanowires as a channelregion extending between a source region and a drain region. Thenanowires typically have diameters that are on the order of tennanometers or less, thereby allowing for the formation of a transistordevice that is much smaller than that achievable using conventionalsilicon technology.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A-1C illustrate some embodiments of a vertical transistor devicehaving vertical channel bars with a rectangular shape extending betweena source region and a drain region.

FIGS. 2A-2B illustrate some embodiments of an integrated chip comprisingvertical transistor devices having vertical channel bars with arectangular shape extending between a source region and a drain region.

FIG. 3 illustrates various embodiments showing vertical channel barconfigurations on a source region of a disclosed vertical transistordevice.

FIG. 4 illustrates some embodiments of an exemplary SRAM layout using adisclosed vertical transistors device with vertical channel bars.

FIG. 5 illustrates a flow diagram of some embodiments of a method offorming a vertical transistor device having vertical channel bars with arectangular shape extending between a source region and a drain region.

FIG. 6 illustrates a flow diagram of some alternative embodiments of amethod of forming an integrated chip having vertical transistor deviceswith vertical channel bars having a rectangular shape extending betweena source region and a drain region.

FIGS. 7-18 illustrate some embodiments of cross-sectional views showinga method of forming a vertical transistor device having vertical channelbars with a rectangular shape extending between a source region and adrain region.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Vertical nanowire transistor devices often comprise a nanowire having acircular or square cross-section, which is vertically disposed betweenan underlying source region and an overlying drain region. Duringoperation of a vertical nanowire transistor, a voltage applied to a gateregion (i.e., a gate electrode) surrounding the nanowire at a positionvertically located between the source region and the drain region, maycause current to either flow through the nanowire or be pinched off.

Because of the small size of nanowires (e.g., typically between 0.1 nmand 10 nm), single nanowires are unable to carry enough current betweena source region and a drain region to make an efficient transistordevice. Therefore, often a plurality of parallel nanowires are locatedbetween a source region and a drain region of a same vertical transistordevice. Since the plurality of parallel nanowires are under the controlof a same gate region, the plurality of parallel nanowires are able tooperate as a single transistor device.

The present disclosure relates to a vertical transistor device withimproved performance and cell area density, comprising vertical channelbars having a rectangular shape extending between a source region and adrain region, and an associated method of formation. In someembodiments, the vertical transistor device comprises a source regiondisposed over a semiconductor substrate. A channel region comprising oneor more vertical channel bars is disposed over the source region. Theone or more vertical channel bars have a bottom surface abutting thesource region that has a rectangular shape (i.e., a shape with foursides separated by four right angles, with adjacent sides havingdifferent length). The vertical transistor device further comprises agate region overlying the source region at a position surrounding theone or more vertical channel bars, and a drain region disposed over thegate region and the one or more vertical channel bars. The rectangularshape of the vertical channel bars allows for improvements inperformance and cell area density in the disclosed vertical transistordevice, relative to a vertical transistors device using circular orsquare nanowires.

FIG. 1A illustrates a three-dimensional view of some embodiments of avertical transistor device 100 having vertical channel bars 108 with arectangular shape extending between a source region 104 and a drainregion 110.

The vertical transistor device 100 comprises a source region 104overlying a semiconductor substrate 102. In some embodiments, the sourceregion 104 comprises a highly doped region having a first doping type(e.g., an n-type doping or a p-type doping with a doping concentrationof greater than approximately 10¹⁷ atoms/cm³). In various embodiments,the semiconductor substrate 102 may comprise any type of semiconductorbody (e.g., silicon, silicon germanium (SiGe), SOI, etc.) such as asemiconductor wafer or one or more die on a wafer, as well as any othertype of semiconductor and/or epitaxial layers formed thereon and/orotherwise associated therewith.

One or more vertical channel bars, 108 a and 108 b, are disposed overthe source region 104. The one or more vertical channel bars, 108 a and108 b, form a channel region 109 of the vertical transistor device 100.The one or more vertical channel bars, 108 a and 108 b, have a bottomsurface 107 abutting a top surface of the source region 104. The bottomsurface 107 has a rectangular shape with adjacent sides having un-equallengths. In some embodiments, the one or more vertical channel bars, 108a and 108 b, have a second doping type that is different than the firstdoping type (e.g., a p-type doping or an n-type doping) of the sourceregion 104. In other embodiments, the one or more vertical channel bars,108 a and 108 b, may comprise a non-doped material. In some embodiments,the vertical channel bars, 108 a and 108 b, may comprise a semiconductormaterial such as silicon (Si), silicon germanium (SiGe), germanium (Ge),indium arsenide (InAs), Gallium arsenide (GaAs), etc. Although verticaltransistor device 100 illustrates two vertical channel bars, 108 a and108 b, it will be appreciated that such an embodiment is not intended ina limiting sense. Rather, a disclosed vertical transistor device 100 mayhave any number of vertical channel bars (e.g., 1, 2, 3, 4, etc.).

A drain region 110 is disposed over the one or more vertical channelbars, 108 a and 108 b. The drain region 110 abuts a top surface(opposing bottom surface 107) of the vertical channel bars, 108 a and108 b, such that the vertical channel bars, 108 a and 108 b, extendbetween the source region 104 and the drain region 110. In someembodiments, the drain region 110 comprises a highly doped region havingthe first doping type of the source region 104 (e.g., an n-type dopingor a p-type doping with a doping concentration of greater thanapproximately 10¹⁷ atoms/cm³).

A gate region 106 comprising a conductive material is verticallydisposed between the source region 104 and the drain region 110 at aposition adjacent to the one or more vertical channel bars, 108 a and108 b. During operation of the vertical transistor device 100, a voltagemay be selectively applied to the gate region 106. The applied voltagecauses the gate region 106 to control the flow of charge carriers 111along the vertical channel bars, 108 a and 108 b, between the sourceregion 104 and the drain region 110. In some embodiments, the gateregion 106 surrounds the one or more vertical channel bars, 108 a and108 b, so as to form a gate-all-around (GAA) transistor device.

FIG. 1B illustrates some embodiments of a top-view 112 of the verticaltransistor device 100.

As shown in top-view 112, the vertical channel bars, 108 a and 108 b,that are disposed between the source region 104 and the drain region 110have a rectangular shape with four sides separated by right angles. Therectangular shape of the vertical channel bars, 108 a and 108 b, causesadjacent sides to have different lengths. For example, the verticalchannel bars, 108 a and 108 b, respectively have a first two opposingsides with a length l and a second two opposing sides with a width w,wherein the length l has a larger value than the width w. In someembodiments, the first two opposing sides of the plurality of verticalchannel bars, 108 a and 108 b, are oriented in parallel to each other inan area over the source region 104 (i.e., first two opposing sides ofthe first vertical channel bar 108 a are oriented in parallel with firsttwo opposing sides of the second channel bar 108 b).

In some embodiments, the length l of the vertical channel bars, 108 aand 108 b, may be in a range of between approximately 4 times andapproximately 20 times the value of the width w of the vertical channelbars, 108 a and 108 b. For example, in some embodiments, the length lmay have a value that is between approximately 20 nm and approximately100 nm and the width w may have a value that is between approximately 5nm and approximately 10 nm. In other embodiments, the length l and widthw may have smaller values or values that vary depending upon a desiredtransistor device characteristic. It will be appreciated that increasingan area in which the gate region 106 surrounds elements of the channelregion 109 also increases the effective width the vertical transistordevice 100. Therefore, the rectangular shape of the one or more verticalchannel bars, 108 a and 108 b, increases the effective width (W_(eff))of the channel region 109 relative to a vertical transistor devicehaving square or circular nanowires

FIG. 1C illustrates some embodiments of a side-view 114 of the verticaltransistor device 100.

As shown in side-view 114, the gate region 106 surrounds the verticalchannel bars, 108 a and 108 b, at a position that is verticallyseparated from the source region 104 and the drain region 110. The gateregion 106 is separated from the vertical channel bars, 108 a and 108 b,by a gate dielectric layer 116 that abuts sidewalls of the verticalchannel bars, 108 a and 108 b.

FIGS. 2A-2B illustrate some embodiments of an integrated chip 200comprising vertical transistor devices, 201 a and 201 b, having verticalchannel bars 108 with a rectangular shape extending between one or moresource regions 104 and one or more drain regions 216.

FIG. 2A illustrates some embodiments of a side-view of the integratedchip 200.

The integrated chip 200 comprises an isolation region 204 (e.g., ashallow trench isolation region) disposed between source regions 104 ofvertical transistor devices 201 a and 201 b. In some embodiments, thesource regions 104 may be disposed within one or more well regions 202located within a semiconductor substrate 102. In such embodiments, thesource regions 104 have a different doping type than the one or morewell regions 202 (e.g., the source regions 104 may have a first dopingtype, while the well region(s) 202 may have a second doping typedifferent than the first doping type). A first insulating layer 206 isdisposed over the source regions 104. In various embodiments, the firstinsulating layer 206 may comprise one or more different dielectriclayers. In some embodiments, the first insulating layer 206 may compriseone or more of silicon-dioxide (SiO₂), silicon nitride (SiN), siliconcarbon-nitride (SiCN), silicon carbon oxy-nitride (SiCON), etc.

A gate dielectric layer 208 is disposed over the first insulating layer206. In some embodiments, the gate dielectric layer 208 may comprise ahigh-k gate dielectric material such as hafnium oxide (HfOx), zirconiumoxide (ZrOx), or aluminum oxide (Al₂O₃), for example. The gatedielectric layer 208 may comprise an ‘L’ shaped structure having ahorizontal leg 208 a and a vertical leg 208 b. The horizontal leg 208 ais oriented in parallel to a top surface of the source regions 104 andthe vertical leg 208 b is oriented in parallel to a sidewall of verticalchannel bars 108.

A gate region 210 is disposed over the gate dielectric layer 208. Thefirst insulating layer 206 and the gate dielectric layer 208 areconfigured to electrically isolate the source region 104 from the gateregion 210. The gate region 210 comprises a conductive material (e.g.,metal or polysilicon). In some embodiments, the gate region 210 maycomprise one or more different layers. For example, in some embodiments,the gate region 210 may comprise a first gate layer 210 a comprising agate work function layer including a material selected to give avertical transistor device, 201 a and 201 b, a selected work function,and an overlying second gate layer 210 b comprising a gate metal layer.In some embodiments, the first gate layer 210 a may comprise titaniumnitride (TiN), tantalum nitride (TaN), titanium aluminum carbide(TiAlC), tantalum aluminum carbide (TaAlC), etc. In some embodiments,the second gate layer 210 b may comprise tungsten (W) or aluminum (Al),for example. In some embodiments, the gate region 210 may also comprisean ‘L’ shaped structure.

A dielectric layer 212 is disposed over the gate region 210. In variousembodiments, the dielectric layer 212 may comprise one or more differentdielectric layers. In some embodiments, the dielectric layer 212 maycomprise a first dielectric layer 212 a disposed onto the gate region210, and an overlying inter-level (ILD) dielectric layer 212 b. In someembodiments, the first dielectric layer 212 a may comprise siliconnitride (SiN), silicon carbon nitride (SiCN), silicon carbon oxy-nitride(SiCON), etc. In some embodiments, the ILD layer 212 b may comprisesilicon dioxide (SiO₂), phosphorous silicon glass (PSG), boron siliconglass (BSG).

A drain spacer 214 is disposed over the gate region 210 and thedielectric layer 212 at positions laterally disposed between thevertical channel bars 108. The drain spacer 214 is configured toelectrically isolate the gate region 210 from a drain region 216. Insome embodiments, the drain region 216 may comprise one or more separatedrain contacts 217 (e.g., a conductive material such as a metal). Insome embodiments, the drain spacer 214 may comprise one or more ofsilicon dioxide (SiO₂), silicon nitride (SiN), silicon carbon nitride(SiCN), silicon carbon oxy-nitride (SiCON), for example.

FIG. 2B illustrates some embodiments of a top-view 218 of the integratedchip 200. As shown in the top-view 218, the side view of the integratedchip 200 (shown in FIG. 2A) is taken along cross-sectional line A-A′.

FIG. 3 illustrates various embodiments of top-views, 300 a-300 c,showing vertical channel bar configurations on a source region of adisclosed vertical transistor device.

A first top-view 300 a of a vertical transistor device illustrates aplurality of single wire channels 304 located over a source region 302.The plurality of single wire channels 304 have square cross-sections(e.g., have four sides with equal lengths). Spacing between theplurality of single wire channels 304 causes the source region 302 tohave a length l₁ and a width w₁.

A second top-view 300 b of a vertical transistor device illustrates aplurality of vertical channel bars 308 located over a source region 306.The plurality of vertical channel bars 308 have rectangularcross-sections with a length that extends in a direction that isparallel to a length (i.e., a larger dimension) of the source region 306(i.e., so that a long side of the plurality of vertical channel bars 308is oriented in parallel with a long side of the source region 306).

Spacing between the plurality of vertical channel bars 308 causes thesource region 306 to have a length l₂ and width w₂, which arerespectively smaller than the length l₁ and width w₁ of the verticaltransistor device shown in top-view 300 a (since the vertical channelbars 308 are formed by a self aligned process as described in relationto method 600). In some embodiments, replacement of the plurality ofsingle wire channels 304 with the plurality of vertical channel bars 308could reduce a size of a source region by 1.2 times or more.

A third top-view 300 c of a vertical transistor device illustrates aplurality of vertical channel bars 310 located over a source region 306.The plurality of vertical channel bars 310 have rectangularcross-sections with a length that extend in a direction that isperpendicular to a length (i.e., a larger dimension) of the sourceregion 306 (i.e., that is perpendicular to vertical channel bars 308).

Top-views 300 d-300 k illustrate alternative embodiments of verticaltransistor devices having a plurality vertical channel bars 308 locatedat different locations over a source region 306. In various embodiments,the plurality of vertical channel bars 308 may have different locationsover the source region 306 for various reasons. For example, in someembodiments, the different location of the vertical channel bars 308relative to the source region 306 may be due to misalignment duringfabrication. In such embodiments, the replacement of the plurality ofsingle wire channels 304 with the plurality of vertical channel bars 308can mitigate alignment problems due to the length of the verticalchannel bars 308 (e.g., since even with misalignment, the plurality ofvertical channel bars 308 still have a large intersection with thesource region 306, so as to mitigate misalignment issues).

FIG. 4 illustrate some embodiments of schematic diagram 400 of an 6TSRAM (static random access memory) cell and a corresponding exemplarySRAM layout 402 comprising vertical transistors devices having verticalchannel bars.

As illustrated in schematic diagram 400, the 6T SRAM cell comprises sixtransistor devices T1-T6. Transistors T2, T3, T4, and T5 form twocross-coupled inverters (e.g., a first inverter comprising T2 and T3 anda second inverter comprising T4 and T5) configured to store data. Twoadditional access transistors T1 and T6 serve to control access to theSRAM cell during read and write operations by way of bit lines BL, BLBand word lines WL.

The SRAM layout 402 comprises gate regions, 404 a and 404 b, overlyingactive regions 406, which may be connected by a conductive path 410.Vertical channel bars 408 are configured to extend through gate regions404 a to form access transistors T1 and T6. Vertical channel bars 408are configured to extend through gate regions 404 b to form transistorsT2, T3, T4, and T5. By using vertical channel bars 408 to formtransistors T1-T6, the size of the SRAM layout 402 can be reducedrelative to SRAMs using transistors devices having single wire channels.

FIG. 5 illustrates a flow diagram of some embodiments of a method 500 offorming a vertical transistor device having vertical channel bars with arectangular shape extending between a source region and a drain region.

While disclosed methods (e.g., methods 500 and 600) are illustrated anddescribed herein as a series of acts or events, it will be appreciatedthat the illustrated ordering of such acts or events are not to beinterpreted in a limiting sense. For example, some acts may occur indifferent orders and/or concurrently with other acts or events apartfrom those illustrated and/or described herein. In addition, not allillustrated acts may be required to implement one or more aspects orembodiments of the description herein. Further, one or more of the actsdepicted herein may be carried out in one or more separate acts and/orphases.

At 502, a source region is formed over a semiconductor substrate.

At 504, one or more vertical channel bar(s) having rectangular shapesare formed at positions overlying the source region. The rectangularshape of the vertical channel bars causes adjacent sides of the verticalchannel bars to have different lengths.

At 506, a gate region is formed to abut the one or more vertical channelbar(s) at positions overlying the source region.

At 508, a drain region is formed over the one or more vertical channelbar(s). By forming the drain region over the one or more verticalchannel bar(s), the one or more vertical channel bar(s) extend betweenthe source region and the drain region.

FIG. 6 illustrates a flow diagram of some alternative embodiments of amethod 600 of forming an integrated chip having vertical transistordevices with vertical channel bars having a rectangular shape extendingbetween a source region and a drain region.

At 602, a device channel layer overlying a source layer is selectivelyetched to form a plurality of vertical channel bars over the sourcelayer.

At 604, the source layer is selectively etched, according to a firstmasking structure comprising the vertical channel bars, to form a trenchthat spatially separates source regions of adjacent vertical transistordevices.

At 606, an isolation region is formed within the trench.

At 608, a gate dielectric layer and a gate layer are formed onto thesubstrate at positions that extend between and over the vertical channelbars.

At 610, the gate layer is etched back from over the one or more verticalchannel bars.

At 612, the gate layer is selectively etched, according to a secondmasking structure comprising the vertical channel bars, to formspatially separate gate regions of adjacent vertical transistor devices.

At 614 a planarization process is performed.

At 616, a drain region is formed over the one or more vertical channelbars.

FIGS. 7-18 illustrate some embodiments of cross-sectional views showinga method of forming a vertical transistor device having vertical channelbars with a rectangular shape extending between a source region and adrain region. Although FIGS. 7-18 are described in relation to themethod 600, it will be appreciated that the structures disclosed inFIGS. 7-18 are not limited to the method 600, but instead may standalone as structures independent of the method 600. Similarly, althoughthe method 600 is described in relation to FIGS. 7-18, it will beappreciated that the method 600 is not limited to the structuresdisclosed in FIGS. 7-18, but instead may stand alone independent of thestructures disclosed in FIGS. 7-18.

FIG. 7 illustrates some embodiments of a cross-sectional view 700corresponding to act 602.

As shown in cross-sectional view 700, a device channel layer 706 isdisposed on a source layer 704 located over a semiconductor substrate102. In some embodiments, the source layer 704 may be formed byselectively implanting the semiconductor substrate 102 with a dopantspecies. In some embodiments, the source layer 704 may be disposedwithin a well region 702 formed within the semiconductor substrate 102.In such embodiments, the source layer 704 has a different doping typethan the well region 702. For example, the source layer 704 may have afirst doping type, while the well region 702 may have a second dopingtype different than the first doping type. In various embodiments, thedevice channel layer 706 may comprise silicon (Si), silicon germanium(SiGe), germanium (Ge), etc.

A masking layer 708 is selectively formed over the device channel layer706 at positions that define one or more vertical channel bars 108(e.g., the masking layer 708 may be formed at positions that overlie thepositions of the vertical channel bars 108). The device channel layer706 is then exposed to a first etchant 710. The first etchant 710 isconfigured to remove the device channel layer 706 from areas not coveredby the masking layer 708, resulting in the formation of the one or morevertical channel bars 108 on the source layer 704. In some embodiments,the first etchant 710 may comprise a wet etchant (e.g., having dilutedhydrochloric acid (HCl)) or a dry etchant (e.g., having an etchingchemistry comprising one or more of fluorine (F), Tetrafluoromethane(CF₄), ozone (O₂), or C₄F₈ (Octafluorocyclobutane)).

FIGS. 8-9 illustrate some embodiments of cross-sectional views, 800 and900, corresponding to act 604.

As shown in cross-sectional view 800, vertical channel bar spacers 801are formed on opposing sides of the vertical channel bars 108. Thevertical channel bar spacers 801 may be formed by depositing one or moredielectric layers. For example, a first dielectric layer 802 and asecond dielectric layer 804 may be deposited between the verticalchannel bars 108. After deposition, the first and second dielectriclayers, 802 and 804, may be selectively etched, using an anisotropicetch, to form the vertical channel bar spacers 801. The anisotropic etchresults in the formation of vertical channel bar spacers 801 onsidewalls of the vertical channel bars 108.

As shown in cross-sectional view 900, a photoresist layer 902 is formedbetween the vertical channel bars 108 of a same vertical transistordevice. For example, as shown in cross-sectional view 800, verticalchannel bars 108 a and 108 b are shared by a first vertical transistordevice 903 a, while vertical channel bars 108 c and 108 d are shared bya second vertical transistor device 903 b. The vertical channel barspacers 801, the photoresist layer 902, and the vertical channel bars108, collectively form a first masking structure 905.

After formation of the photoresist layer 902, the source layer 704 isselectively exposed to a second etchant 904, which is configured to etchthe source layer 704 according to the first masking structure 905 toform a trench 906 located between spatially separated source regions,104 a and 104 b, of adjacent vertical transistor devices, 903 a and 903b. By using the vertical channel bar spacers 801 as part of the firstmaking structures 905 that defines the spatially separated sourceregions, 104 a and 104 b, can be formed close together, thereby allowingfor source regions, 104 a and 104 b, having a relatively small area.

FIGS. 10-11 illustrate some embodiments of cross-sectional views, 1000and 1100, corresponding to act 606.

As shown in cross-sectional view 1000, a dielectric material 1002 isformed within the trench 906 and between adjacent vertical channel bars108. In some embodiments, the dielectric material 1002 may comprise anoxide formed by way of a deposition process. A planarization process isthen performed. The planarization process removes excess of thedielectric material 1002 and/or masking layer 708, thereby forming aplanar top surface 1004.

As shown in cross-sectional view 1100, the dielectric material 1002 isexposed to a third etchant 1102 configured to etch back the dielectricmaterial 1002 to form an isolation region 204 (e.g., a shallow trenchisolation region) at a position laterally between the spatiallyseparated source regions, 104 a and 104 b. In some embodiments, theisolation region 204 may have a top surface that is aligned with a topsurface of the spatially separated source regions, 104 a and 104 b. Thevertical channel bar spacers 801 are also removed (e.g., by selectiveetching) after the etch back. In some embodiments, a source silicidelayer 1104 may be formed within the spatially separated source regions,104 a and 104 b, at positions adjacent to the vertical channel bars 108.Although the source silicide layer 1104 is illustrated as being formedin cross-sectional view 1100, it will be appreciated that in otherembodiments, it may be formed at other points in the process.

FIG. 12 illustrates some embodiments of a cross-sectional view 1200corresponding to act 608.

As shown in cross-sectional view 1200, an insulating layer 1202 isformed over the spatially separated source regions, 104 a and 104 b, andthe isolation region 204. In various embodiments, the insulating layer1202 may comprise a first insulating layer 1202 a and an overlyingsecond insulating layer 1202 b. In some embodiments, the first andsecond insulating layers, 1202 a and 1202 b, may comprise one or more ofsilicon-dioxide (SiO₂), silicon nitride (SiN), silicon carbon-nitride(SiCN), silicon carbon oxy-nitride (SiCON), etc.

A gate dielectric layer 1204 is subsequently formed over the firstinsulating layer 1202 and a gate layer 1206 is formed over the gatedielectric layer 1204. The gate dielectric layer 1204 and the gate layer1206 are formed at positions that extend between and over the verticalchannel bars 108. In some embodiments, the gate dielectric layer 1204and the gate layer 1206 may be formed by way of a vapor depositiontechnique (e.g., CVD, PVD, etc.) or by way of atomic layer deposition(ALD). In some embodiments, the deposition may cause the gate dielectriclayer 1204 and the gate layer 1206 to comprise ‘L’ shaped structures. Insome embodiments, the gate dielectric layer 1204 may comprise a high-kgate dielectric material (e.g., such as hafnium oxide (HfOx), zirconiumoxide (ZrOx), Aluminum oxide (Al2O3), etc.). In some embodiments, thegate layer 1206 may include a first gate layer 1206 a comprising amaterial (e.g., TiN, TaN, TiAlC, TaAlC, etc.) selected to adjust a workfunction of an associated transistor device, and an overlying secondgate layer 1206 b comprising a gate metal layer (e.g., W, Al, etc.).

In some embodiments, a dielectric layer 1208 may be disposed over thegate layer 1206. The dielectric layer 1208 may comprise a firstdielectric layer 1208 a and an overlying inter-level dielectric (ILD)layer 1208 b. In some embodiments, the first dielectric layer 1208 a maycomprise silicon nitride (SiN), silicon carbon nitride (SiCN), siliconcarbon oxy-nitride (SiCON), etc. In some embodiments, the ILD layer 1208b may comprise silicon dioxide, phosphorous silicon glass (PSG), boronsilicon glass (BSG).

FIG. 13 illustrates some embodiments of a cross-sectional view 1300corresponding to act 610.

As shown in cross-sectional view 1300, the gate dielectric layer 1204and the gate layer 1206 are exposed to a fourth etchant 1302 configuredto form a gate dielectric layer 1204′ and the gate layer 1206′ byetching back the gate dielectric layer 1204 and the gate layer 1206 fromover one or more vertical channel bars 108. Etching back the gatedielectric layer 1204 and the gate layer 1206 exposes the verticalchannels bars 108 in areas that are vertically over the dielectric layer1208 (i.e., so that an upper part of the vertical channel bars 108 aresurrounded by the gate dielectric layer 1204′, while a second upper partof the vertical channel bars 108 are not surrounded by the gatedielectric layer 1204′).

FIGS. 14-16 illustrates some embodiments of cross-sectional views,1400-1600, corresponding to act 612.

As shown in cross-sectional view 1400, a spacer material comprising anelectrically insulating material is deposited onto the substrate andselectively etched to form drain spacers 1402 on opposing sides of thevertical channel bars 108. In some embodiments, the drain spacers 1402may comprise an oxide (e.g., silicon dioxide), silicon nitride (SiN),silicon carbon-nitride (SiCN), silicon carbon oxy-nitride (SiCON), etc.

As shown in cross-sectional view 1500, a patterning layer 1501 is formedover the drain spacers 1402 and the dielectric layer 212. The patterninglayer 1501 may comprise one or more masking layers 1502-1506 formed overthe dielectric layer 212. The drain spacers 1402, the vertical channelbars 108, and the patterning layer 1501 form a second masking structureused in selectively etching the gate layer 1206′. The gate layer 1206′is exposed to a fifth etchant 1510 according to the second maskingstructure to form a cavity 1508 that forms spatially separated gateregions 210 for adjacent vertical transistor devices. After etching, thepatterning layer 1501 is removed, as shown in cross-sectional view 1600.

FIG. 17 illustrates some embodiments of a cross-sectional view 1700corresponding to act 614.

As shown in cross-sectional view 1700, a planarization process isperformed. In some embodiments, an additional ILD layer 1702 may beformed surrounding the drain spacers 1402 prior to the planarizationprocess. The planarization process removes the masking layer 708 and apart of the drain spacers 214 and the additional ILD layer 1702, therebyforming a planar top surface 1704, and also defining a length of thevertical channel bars 108 between the spatially separated sourceregions, 104 a and 104 b, and a subsequently formed drain region.

FIG. 18 illustrates some embodiments of a cross-sectional view 1800corresponding to act 616.

As shown in cross-sectional view 1800, drain regions 216 are formed overone or more vertical channel bars 108. In some embodiments, the drainregions 216 may be formed by forming a doped silicon material over thevertical channel bars 108 and then selectively etching the doped siliconmaterial to define the drain regions 216.

Therefore, the present disclosure relates to a vertical transistordevice having vertical channel bars with a rectangular shape extendingbetween a source region and a drain region, and an associated method offormation.

In some embodiments, the present disclosure relates to a verticaltransistor device. The vertical transistor device comprises a sourceregion disposed over a semiconductor substrate. The vertical transistordevice further comprises a channel region comprising one or morevertical channel bars disposed over the source region, wherein the oneor more vertical channel bars have a bottom surface with a rectangularshape that abuts the source region. The vertical transistor devicefurther comprises a gate region overlying the source region at aposition separated from sidewalls of the one or more vertical channelbars by a gate dielectric layer, and a drain region disposed over thegate region and the one or more vertical channel bars.

In other embodiments, the present disclosure relates to a verticaltransistor device. The vertical transistor devices comprises a sourceregion disposed over a semiconductor substrate and a drain regiondisposed over the source region. A plurality of vertical channel barsextend between the source region and the drain region. The plurality ofvertical channel bars have a bottom surface abutting the source regionthat has a first two opposing sides with a length and a second twoopposing sides with a width that is smaller than the length. A gateregion surrounds the plurality of vertical channel bars at a positionvertically separated from the source region and vertically separatedfrom the drain region.

In yet other embodiments, the present disclosure relates to a method offorming a vertical transistor device. The method comprises forming asource region over a semiconductor substrate. The method furthercomprises forming one or more vertical channel bars having a rectangularshape at positions overlying the source region. The method furthercomprises forming a gate region surrounding the one or more verticalchannel bars at a position overlying source region, and forming a drainregion over the one or more vertical channel bars.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A vertical transistor device, comprising: asource region disposed over a semiconductor substrate; a channel regioncomprising one or more vertical channel bars disposed over the sourceregion, wherein the one or more vertical channel bars have a bottomsurface with a rectangular shape that abuts the source region; a gateregion overlying the source region at a position separated fromsidewalls of the one or more vertical channel bars by a gate dielectriclayer; and a drain region disposed over the gate region and the one ormore vertical channel bars.
 2. The vertical transistor device of claim1, wherein the one or more vertical channel bars respectively have afirst two opposing sides having a length and a second two opposing sideshaving a width that is smaller than the length; and wherein the firsttwo opposing sides of the one or more vertical channel bars are orientedin parallel over the source region.
 3. The vertical transistor device ofclaim 2, wherein the first two opposing sides of the one or morevertical channel bars extend in a direction that is perpendicular to alength of the source region.
 4. The vertical transistor device of claim2, wherein the first two opposing sides of the one or more verticalchannel bars extend in a direction that is parallel to a length of thesource region.
 5. The vertical transistor device of claim 2, wherein thelength of the one or more vertical channel bars is between approximatelytwo and approximately twenty times larger than the width of the one ormore vertical channel bars.
 6. The vertical transistor device of claim1, wherein the gate region extends along a portion of the one or morevertical channel bars that is vertically separated from the drain regionby an insulating material.
 7. The vertical transistor device of claim 1,wherein the gate region surrounds the one or more vertical channel bars.8. The vertical transistor device of claim 1, wherein gate regioncomprises an ‘L’ shaped structure having a horizontal leg and a verticalleg; and wherein the horizontal leg is oriented in parallel to a topsurface of the source region and the vertical leg is oriented inparallel to the sidewalls of the one or more vertical channel bars. 9.The vertical transistor device of claim 8, wherein the gate dielectriclayer comprises a dielectric high-k material disposed over the sourceregion and abutting the sidewalls of the one or more vertical channelbars; wherein the gate region comprises: a gate work function layerdisposed onto the gate dielectric layer and configured to influence awork function of the vertical transistor device; and a gate metal layercomprising a conductive material disposed onto the gate work functionlayer.
 10. A vertical transistor device, comprising: a source regiondisposed over a semiconductor substrate; a drain region disposed overthe source region; a plurality of vertical channel bars extendingbetween the source region and the drain region, wherein the plurality ofvertical channel bars have a bottom surface abutting the source regionthat has a first two opposing sides with a length and a second twoopposing sides with a width that is smaller than the length; and a gateregion surrounding the plurality of vertical channel bars at a positionvertically separated from the source region and vertically separatedfrom the drain region.
 11. The vertical transistor device of claim 10,wherein the first two opposing sides of the plurality of verticalchannel bars extend in a direction that is oriented in perpendicular toa length of the source region.
 12. The vertical transistor device ofclaim 10, wherein the first two opposing sides of the plurality ofvertical channel bars extend in a direction that is oriented in parallelto a length of the source region.
 13. The vertical transistor device ofclaim 10, wherein gate region comprises an ‘L’ shaped structure having ahorizontal leg and a vertical leg; and wherein the horizontal leg isoriented in parallel to a top surface of the source region and thevertical leg is oriented in parallel to sidewalls of the plurality ofvertical channel bars.
 14. The vertical transistor device of claim 13,further comprising: a gate dielectric layer comprising a high-kdielectric material disposed over the source region and abutting thesidewalls of the vertical channel bars; wherein the gate regioncomprises: a gate work function layer disposed onto the gate dielectriclayer and configured to influence a work function of the verticaltransistor device; and a gate metal layer comprising a conductivematerial disposed onto the gate work function layer.
 15. The verticaltransistor device of claim 10, wherein the length of the plurality ofvertical channel bars is between approximately two and approximatelytwenty times larger than the width of the plurality of vertical channelbars.
 16. A method of forming a vertical transistor device, comprising:forming a source region over a semiconductor substrate; forming one ormore vertical channel bars having a rectangular shape at positionsoverlying the source region; forming a gate region surrounding the oneor more vertical channel bars at a position overlying source region; andforming a drain region over the one or more vertical channel bars. 17.The method of claim 16, wherein forming the one or more vertical channelbars comprises: selectively etching a device channel layer overlying asource layer according to a masking layer to form the one or morevertical channel bars over the source layer.
 18. The method of claim 17,further comprising: selectively etching the source layer, according to afirst masking structure comprising the one or more vertical channelbars, to form a trench located between spatially separated sourceregions for adjacent vertical transistor devices.
 19. The method ofclaim 18, further comprising: selectively etching a gate layer,according to a second masking structure comprising the one or morevertical channel bars, to form spatially separate gate regions for theadjacent vertical transistor devices.
 20. The method of claim 16,wherein the one or more vertical channel bars respectively have a firsttwo opposing sides having a length and a second two opposing sideshaving a width that is smaller than the length; and wherein the firsttwo opposing sides of the one or more vertical channel bars are parallelto each other over the source region.